Rotatable cathode : CMC-RT
CNI Technology is Korea's first company to mass-produce rotatable cathodes successfully.
High-efficiency sputtering is possible using a cylindrical target.
- Easy to maintenance design with high reliability
- Variable sputtering incident angle : 18˚ ~ 30˚
- Supply customized magnet bar to fit process requirements
- Variable sputtering tilting angle : 0˚ ~ 60˚
- Patented dual magnet design for high efficiency
- Thickness Non-uniformity : < ±5% (@ All layer)
- Target erosion efficiency : ≥ 80%
- Uniformity of RTR : ≤ ±3%