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2020`s
- 2021
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SepShieldRus-1200 to China
JunAcquire a new factory site in Dongtan
MayShieldRus-1200L to Company N
AprShieldRus-1200L to Taiwan
- 2020
-
MarShieldRus-1200 #1 to Company B
MarShieldRus-1200 #2 to Company B
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2010`s
- 2019
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JulShieldRus-200H to Thailand
JunShieldRus-1200 to Company A
- 2018
-
SepStrip handling solution with MF-Seal
May8” wafer evaporation system for infrared sensor to Company T
AprVacuSeal-300(MF-Seal process) to Mexico
- 2017
-
AprOLED evaporation system development
MarShieldRus-1200s EMI sputtering equipment development
FebDeveloped MF-Seal process
JanFerro-Magnetic sputtering Cathode Development
- 2016
-
DecCompleted verification of ShieldRus-1200 mass production
JulDelivered Gen 8 OLED Vacuum Transfer system
JunSelected with Global Small Giant company
MayDeveloped ShieldRus-1200 Cubicle inline system
AprSelected with Advanced Technology Center
- 2015
-
DecDeveloped OLED Gen.8 Mask/tray stock
AprMove to new factory in Dongtan
Shipment of improved inline sputtering systemFebDeveloped InLine-Cluster system, ShieldRus
JanDeveloped Mechem process(Pressing & Stamping)
- 2014
-
OctDeveloped In-line sputtering technology for EMI shielding on
BGA package.AugISO9001 certificate
Develop 200mm x 200mm OLED cluster system.JunDeveloped Cylindrical Cathode & mass production process
AprDeveloped CURUS-C200TM & H-VAMs
MarDeveloped In-line sputtering system for EMI shielding
- 2013
-
SepDeveloped sputter system for EMI shielding
AugRegistered as a INNOBIZ company by KIBO
AprDeveloped ITO sputter system for OLED
FebDeveloped Gen 8 Mask / flip stock
JanDeveloped High temp. evaporation source
- 2012
-
OctDeveloped rotation magnet block and round cathode
JunDeveloped cluster type sputter system for LED
FebDeveloped Gen. 5.5 mask stock chamber
- 2011
-
DecDeveloped Gen. 5.5 flip chamber
NovFounded R&D center to CNI Technology
AprDeveloped the linear stage for OLED
Registered to Cooperation(7195-943-1080-362)MarDeveloped the rectangular cathode for Gen. 5 CIGS
FebDeveloped inline sputtering system for Solar
- 2010
-
AugRegistered as a venture company
JulDeveloped dual magnetron cathode for ITO target
MayDeveloped the rectangular magnetron cathode
for Gen. 5 ITO targetMarFounded CNI Technology(2010/03/20)