SIGMA 1000: In-line Sputtering System
The SIGMA1000 series specializes in mass production that can form a uniform thin film
on products of various sizes and shapes, such as glass, films, and plastics.
Key Features
- Design specialized for mass production
- Substrate size : < 2000mm(L) * 2000mm(W) * 100mm(H)
- Cathode type : Cylindrical, Rectangular
- Target materials: Various metals
such as Ti, Cu, SUS, Ag, and Au and ferromagnetic materials
such as Si, Ni, NiFe, ITO, and ZnO - Application fields: Glass, electronic parts, home appliances, automotive parts
