蒸镀机系统
主要特点
- Application：OLED material评价与元件开发
- Substrate : 200 x 200mm2
- Base pressure : ≤ 2E-7 Torr
- Thickness non-uniformity : ≤ ± 2%(@OC), ≤ ± 3%(@MC),
- Mask alignment : mechanical(≤ 100 ㎛), vision(3.0 ㎛)
- Evaporation Cell : LTC 20cc, HTC 20cc, Al 40cc
