끊임없는 열정으로 항상 발전하는 씨앤아이테크놀로지가 되겠습니다.


As the core technology of sputter system, magnetron cathode can maximize the target erosion efficiency and productivity through optimized
magnetron design. As per customer’s requests, CNI Technology can provide variable custom design cathodes with magnetic field and structural

On the basis of long-term experience in the core technology of magnetron sputtering and B-field simulation,
CNI Technology possesses an optimum magnetron design technology depending on target material and process type.

CNI Technology’s cathode is applied by optimized design elements for customer’s convenience and stable operation.

Using the CMC-RT series cathode, it is possible to implement high efficiency sputtering over than 85% target erosion.