SPUTTER SYSTEM

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Core technology

CNI Technology supplies customized cathode with core technologies.

CNI Technology was succeeded on the first domestic mass production of rotatable cathode. A high-efficiency sputtering is possible using the
cylindrical target.

Key Features
  • - Easy to maintenance design with high reliability
  • - Variable sputtering incident angle : 18˚ ~ 30˚
  • - Supply customized magnet bar to fit process requirements
  • - Variable sputtering tilting angle : 0˚ ~ 60˚
  • - Patented dual magnet design for high efficiency
  • - Thickness Non-uniformity : < ±5% (@ All layer)
  • - Target erosion efficiency : ≥ 80%
  • - Uniformity of RTR : ≤ ±3%

As the most widely used product, rectangular cathode can be manufactured with various sizes.

Key Features
  • - Target width : ~ 200mm
  • - Multi-zone gas supply
  • - Target length : ~ 3,000mm
  • - Mass flow control for process gas
  • - Target erosion efficiency : ≥ 40%
  • - RF, DC, Pulsed DC compatible
  • - Metal & oxide target

High efficiency sputtering of large area target is available by the magnet array scans target rear through servo motor or rotary actuator.

Key Features
  • - High target erosion efficiency : ≥ 60 %
  • - RF, DC compatible
  • - Widest range target available : ≥ 200㎜
  • - Cooling path imbedded backing plate for high cooling efficiency
  • - Magnet block control by servo motor
  • - Imbedded gas supply unit

Dual magnetron cathode consists two symmetrical targets. Power can be applied to each target independently.

Key Features
  • - Target erosion efficiency : ≥ 40%
  • - Middle frequency power supply
  • - Cathode for reactive sputter
  • - Direct cooling on magnet block without magnet corrosion
  • - Two magnetron with an asymmetric magnetic design

CNI Technology has the technology to manufacture various circular cathode size from 2 inch to 14 inch. Especially, plasma arcing and particle issue
was controlled by eliminating the re-depo area of target center.

Key Features
  • - Target erosion efficiency : > 40 %
  • - Uniformity : ≤ 5 %
  • - RF, DC, Pulsed DC compatible
  • - Metal & oxide target
  • - Target size : 4~16 inch